Inelastic deformation of plasma polymerised thin films facilitated by transient dense plasma focus irradiation
Grant, Daniel S., Rawat, Rajdeep S., Bazaka, Kateryna, and Jacob, Mohan V. (2017) Inelastic deformation of plasma polymerised thin films facilitated by transient dense plasma focus irradiation. Materials Research Express, 4 (9). 096407. pp. 1-4.
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Abstract
The high degree of crosslinking present in plasma polymerised thin films, coupled with their high molecular weight, imbues these films with properties similar to those of thermosetting polymers. For instance, such films tend to be relatively hard, insoluble, and to date have not exhibited plasticity when subjected to elevated temperatures. In this paper it is demonstrated that plasma polymers can, in fact, undergo plastic deformation in response to the application of extremely short-lived thermal treatment delivered by a dense plasma focus device, as evidenced by the evolution of bubble-like structures from the thin film. This finding suggests new avenues for texturing plasma thin films, and synthesising cavities that may find utility as thermal insulators or domains for material encapsulation.
Item ID: | 50230 |
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Item Type: | Article (Research - C1) |
ISSN: | 2053-1591 |
Keywords: | plasma polymer; dense plasma focus; inelastic deformation;thermal degradation |
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Additional Information: | A version of this publication was included as Chapter 5 of the following PhD thesis: Grant, Daniel Shane (2017) Investigation into the effects of ionising radiation on plasma polymer monoterpene alcohols for applications in organic electronics. PhD thesis, James Cook University, which is available Open Access in ResearchOnline@JCU. Please see the Related URLs for access. |
Funders: | Australian Postgraduate Award (APA) |
Date Deposited: | 18 Sep 2017 00:29 |
FoR Codes: | 40 ENGINEERING > 4016 Materials engineering > 401609 Polymers and plastics @ 100% |
SEO Codes: | 86 MANUFACTURING > 8698 Environmentally Sustainable Manufacturing > 869899 Environmentally Sustainable Manufacturing not elsewhere classified @ 100% |
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