Catalyst-free plasma enhanced growth of graphene from sustainable sources

Jacob, Mohan V., Rawat, Rajdeep S., Ouyang, Bo, Bazaka, Kateryna, Kumar, D. Sakthi, Taguchi, Dai, Iwamoto, Mitsumasa, Neupane, Ram, and Varghese, Oomman K. (2015) Catalyst-free plasma enhanced growth of graphene from sustainable sources. Nano Letters, 15. pp. 5702-5708.

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Abstract

Details of a fast and sustainable bottom-up process to grow large area high quality graphene films without the aid of any catalyst are reported in this paper. We used Melaleuca alternifolia, a volatile natural extract from tea tree plant as the precursor. The as-fabricated graphene films yielded a stable contact angle of 135°, indicating their potential application in very high hydrophobic coatings. The electronic devices formed by sandwiching pentacene between graphene and aluminum films demonstrated memristive behavior, and hence, these graphene films could find use in nonvolatile memory devices also.

Item ID: 40284
Item Type: Article (Research - C1)
ISSN: 1530-6984
Keywords: graphene; PECVD; hydrophobic; memristor
Funders: ARC DECRA fellowship, Nanyang Technological University, Singapore
Projects and Grants: NIE/NTU AcRF grant (RI 7/11 RSR)
Date Deposited: 25 Aug 2015 23:08
FoR Codes: 09 ENGINEERING > 0912 Materials Engineering > 091299 Materials Engineering not elsewhere classified @ 100%
SEO Codes: 85 ENERGY > 8598 Environmentally Sustainable Energy Activities > 859899 Environmentally Sustainable Energy Activities not elsewhere classified @ 100%
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