The mechanism of gold deposition by thermal evaporation

Barnes, Mark C., Kim, Doh-Y., and Hwang, Nong M. (2000) The mechanism of gold deposition by thermal evaporation. Journal of Ceramic Processing Research, 1 (1). pp. 45-52.

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The charged cluster model states that chemical vapor deposition (CVD) begins with gas phase nucleation of charged clusters followed by cluster deposition on a substrate surface to form a thin film. A two-chambered system, separated by a 1-mm orifice, was used to study gold deposition by thermal evaporation in order to determine if the CCM applies in this case. At a filament temperature of 1523 and 1773 K, the presence of nano-meter sized gold clusters was confirmed by transmission electron microscopy (TEM). The charge on the primary clusters was found to be positive and the cluster size and size distribution increased with increasing temperature. Small clusters were found to be amorphous and they combined with clusters already deposited on a substrate surface to form larger amorphous clusters on the surface. This work revealed that gold thin films deposited on a mica surface are the result of the sticking of 4-10 nm clusters. The topography of these films was similar to those reported previously under similar conditions.

Item ID: 38186
Item Type: Article (Research - C1)
ISSN: 1229-9162
Funders: Korea Ministry of Science and Technology
Date Deposited: 12 Aug 2021 00:30
FoR Codes: 02 PHYSICAL SCIENCES > 0204 Condensed Matter Physics > 020401 Condensed Matter Characterisation Technique Development @ 50%
10 TECHNOLOGY > 1007 Nanotechnology > 100706 Nanofabrication, Growth and Self Assembly @ 50%
SEO Codes: 97 EXPANDING KNOWLEDGE > 970109 Expanding Knowledge in Engineering @ 100%
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