Sheppard, L., Bak, T., Nowotny, J., Sorrell, C.C., Kumar, S., Gerson, A.R., Barnes, M.C., and Ball, C. (2006) Effect of niobium on the structure of titanium dioxide thin films. Thin Solid Films, 510 (1-2). pp. 119-124.

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Abstract

This paper reports the effect of niobium on the structure of titanium dioxide (TiO2) thin films deposited on glass. The results obtained indicated that the direct current (DC) co-sputtering of Ti and Nb onto glass substrates in the presence of oxygen results in the formation of Nb-doped anatase thin films with strong preferential orientation. In the concentration range between 0 and 40 at.% Nb, niobium is incorporated into the TiO2 lattice according to a substitution mechanism, entering Ti sites in the cation sub-lattice. No evidence exists for a solubility limit < 40 at.% of Nb under the applied deposition conditions, however, it is not believed that an equilibrium situation prevails. Lattice charge compensation was concluded to occur by the formation of cation vacancies for samples with up to 10 at.% Nb, and by Ti3+ or Nb4+ ions for the samples with ≥ 15 at.% Nb, the latter in conjunction with cation vacancy compensation.

Item ID:	38179
Item Type:	Article (Research - C1)
ISSN:	1879-2731
Keywords:	growth mechanism; x-ray diffraction; sputtering; titanium oxide
Funders:	Australian Research Council (ARC), Australian Institute of Nuclear Science and Engineering (AINSE)
Date Deposited:	09 Apr 2015 02:42
FoR Codes:	02 PHYSICAL SCIENCES > 0204 Condensed Matter Physics > 020405 Soft Condensed Matter @ 20% 02 PHYSICAL SCIENCES > 0204 Condensed Matter Physics > 020401 Condensed Matter Characterisation Technique Development @ 40% 10 TECHNOLOGY > 1007 Nanotechnology > 100706 Nanofabrication, Growth and Self Assembly @ 40%
SEO Codes:	85 ENERGY > 8599 Other Energy > 859999 Energy not elsewhere classified @ 10% 97 EXPANDING KNOWLEDGE > 970110 Expanding Knowledge in Technology @ 90%
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