Sieber, I., Kannan, B., and Schmuki, P. (2005) Self-assembled porous tantalum oxide prepared in H2SO4/HF electrolytes. Electrochemical and Solid-State Letters, 8 (3). pp. 10-12.

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Abstract

The formation of porous Ta2O5 on tantalum was investigated in H2SO4 electrolytes containing low concentrations of HF (0.15 wt %). Under optimized electrochemical conditions, porous Ta2O5 consisting of self-assembled pore arrays with single pore diameters of ~20 nm and a pore spacing of ~15 nm forms. The pore structure and the pore distribution depend on the concentration of HF, the anodization voltage, and the time for anodic oxidation. Porous layers ~400 nm thick with a regular pore distribution can be formed. For thicker layers cracking and a tendency for delamination was observed.

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