Influence of RF heating on microwave loss
Jacob, Mohan V. (2006) Influence of RF heating on microwave loss. In: Proceedings of the 2006 International Conference on Microwaves, Radar & Wireless Communications (1), pp. 247-250. From: MIKON 2006 International Conference on Microwaves, Radar & Wireless Communications 2006, 22-24 May 2006, Krakow, Poland.
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Typically dielectric materials are used as a substrate for the fabrication of thin films. Some of the commonly used substrates are Quartz, Sapphire, MgO, LAO. Even though they are expensive the loss associated with these materials at high frequencies is low. In this paper the influence of RF heating on the high frequency loss of a commonly available OHP transparency film is scrutinized. It has been observed that the loss tangent of the material decreases once the 'OHP transparency film' is exposed to high RF power. The loss tangent decrease by 39% when the sample is exposed to RF power of 25 W for 30 minutes. The sample is also tested using microwave heating and conventional heating.
|Item Type:||Conference Item (Refereed Research Paper - E1)|
|Keywords:||RF heating; microwave loss; loss tangent; substrate|
|Date Deposited:||19 Nov 2009 01:46|
|FoR Codes:||09 ENGINEERING > 0912 Materials Engineering > 091201 Ceramics @ 100%|
|SEO Codes:||97 EXPANDING KNOWLEDGE > 970102 Expanding Knowledge in the Physical Sciences @ 60%
86 MANUFACTURING > 8617 Communication Equipment > 861799 Communication Equipment not elsewhere classified @ 40%
|Citation Count from Scopus||